RTP快速退火設(shè)備

所屬分類：

快速退火爐

概要：

◆ 快速退火爐是利用紅外熱輻射實(shí)現(xiàn)快速加熱的一種半導(dǎo)體熱處理工藝設(shè)備，通過燈光輻射型熱源功率控制模塊裝置和專用燈組對(duì)位于工藝腔體的半導(dǎo)體硅片進(jìn)行快速加熱來實(shí)現(xiàn)穩(wěn)定的升溫過程

關(guān)鍵詞：

RTP快速退火

RTP快速退火設(shè)備

產(chǎn)品概述/Product Introduction：

Rapid annealing furnace is a kind of semiconductor heat treatment equipment which uses infrared heat radiation to realize rapid heating. The semiconductor silicon wafer located in the process cavity is rapid-ly heated by a light radiation type heat source power control module device and a special lamp group to realize a stable heating process

產(chǎn)品特點(diǎn)/Product Characteristics：

◆ 溫度控制精度高、重復(fù)性好

High temperature control precision and good repeatability

◆ 干凈清潔的工藝腔體

Clean and clean process chamber

◆ 用戶可根據(jù)要求定制工藝氣體,最多可配置6路氣體

Users can customize the process gas according to their requirements, and can configure up to 6channels of gas

◆ 工藝過程計(jì)算機(jī)全自動(dòng)控制

Computer automatic control of technological process

◆ 樣品尺寸:2-6英寸

Sample size: 2-6 inches

◆ 升降溫速率:0-100°C/S可控