RTP快速退火設(shè)備

所屬分類：

快速退火爐

概要：

◆ 快速退火爐是利用紅外熱輻射實現(xiàn)快速加熱的一種半導體熱處理工藝設(shè)備，通過燈光輻射型熱源功率控制模塊裝置和專用燈組對位于工藝腔體的半導體硅片進行快速加熱來實現(xiàn)穩(wěn)定的升溫過程

關(guān)鍵詞：

RTP快速退火

RTP快速退火設(shè)備

產(chǎn)品概述/Product Introduction：

Rapid annealing furnace is a kind of semiconductor heat treatment equipment which uses infrared heat radiation to realize rapid heating. The semiconductor silicon wafer located in the process cavity is rapid-ly heated by a light radiation type heat source power control module device and a special lamp group to realize a stable heating process

產(chǎn)品特點/Product Characteristics：

◆ 溫度控制精度高、重復性好

High temperature control precision and good repeatability

◆ 干凈清潔的工藝腔體

Clean and clean process chamber

◆ 用戶可根據(jù)要求定制工藝氣體,最多可配置6路氣體

Users can customize the process gas according to their requirements, and can configure up to 6channels of gas

◆ 工藝過程計算機全自動控制

Computer automatic control of technological process

◆ 樣品尺寸:2-6英寸

Sample size: 2-6 inches

◆ 升降溫速率:0-100°C/S可控