山東力冠微電子裝備

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LPCVD設備

?適用領域:集成電路、先進封裝 Relevant Industries: Integrated Circuits, Advanced Packaging ?適用材料:Si Suitable for Processing: Silicon (Si) ?晶圓尺寸:12/8 英寸 Wafer Size: 12/8 inch ?適用工藝:氮化硅(SiN)、多晶硅(Poly-Si/U-Poly/D-Poly)、二氧化硅(TEOS)、HTO等 Applicable Processes: Silicon Nitride (SiN) Deposition, Polysilicon (Poly-Si / U-Poly / D-Poly) Deposition, Silicon Dioxide (TEOS) Deposition, HTO, etc.

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